Circuit for providing an adjustable reference voltage for...

Static information storage and retrieval – Systems using particular element – Ferroelectric

Reexamination Certificate

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C365S065000, C365S185200, C365S185230, C365S149000

Reexamination Certificate

active

06392916

ABSTRACT:

This application relies for priority upon Korean Patent Application No. 1999-42355, filed on Oct. 1, 1999 and No. 2000-46678, filed on Aug. 11, 2000, the contents of which are herein incorporated by reference in their entirety.
1. Field of the Invention
The present invention relates to ferroelectric random access memory devices and, more particularly, to a reference voltage generation circuit for ferroelectric random access memory devices.
2. Background of the Invention
A ferroelectric random access memory (hereafter referred to as“FRAM” uses a ferroelectric capacitor as a storage element of each memory cell. Each ferroelectric memory cell stores a logic state based upon electric polarization of its ferroelectric capacitor. A ferroelectric capacitor has dielectric material including ferroelectric material such as PZT(PbZrTiO
3
; lead-zirconate-titanate) between its two electrode plates. When a voltage is applied to both plates of a ferroelectric capacitor, ferroelectric material is polarized toward an electric field. A switching threshold voltage for changing polarization state of a ferroelectric capacitor is called a“coercive voltage”
A ferroelectric capacitor exhibits a hysteresis characteristic, and through which current corresponding to its polarization state flows, If a ferroelectric capacitor is biased with an applied voltage higher than its coercive voltage, the capacitor will change its polarization state according to polarity of the applied voltage. The polarization state is maintained even after power down, which makes the memory cell non-volatile.
Polarization states of ferroelectric capacitor can be changed in less time than about
1
nanosecond, which its faster than the programming time of other non-volatile memories, such as flash EEPROMs (electrically erasable programmable read only memories).
Data stored in a ferroelectric memory cell is read out as follows. A voltage is applied to both electrodes of a ferroelectric memory cell capacitor, and then a variation of charges induced on a bit line coupled to the memory cell is sensed. In order to sense the variation of the induced charges(i.e., voltages), a circuit is needed that generates a reference voltage having a voltage value that is intermediate to voltages corresponding to data“1” and data“0”. Conventionally, the reference voltage is generated by use of a reference cell that includes a ferroelectric capacitor having characteristics similar to that of a memory cell.
A perplexing problem in sensing the polarization state of the ferroelectric capacitor in a single capacitor memory cell is that the electric field/polarization characteristic loop (hysteresis curve) of a ferroelectric capacitor changes over time. The change is due to aging from use, or due to aging from being left in a polarization state for an extended time. Generally, this change in polarization properties with time results in a collapsing of the hysteresis curve. This is a basic materials phenomenon that is due to a non-reversibility in at least a portion of the volume of the ferroelectric material under electric field/polarization cycling. This changing of the ferroelectric material makes it very difficult to use a conventional reference cell strategy to determine the polarization state Of ferroelectric memory cells.
A variety of techniques have been suggested to overcome such problems. One solution is described in U.S. Pat. No. 5,432,731, entitled“FERROELECTRIC MEMORY CELL AND METHOD OF SENSING AND WRITING THE POLARIZATION STATE THEREOF” issued to Howard C. Kirsch et al., on Jul. 11, 1995. The Kirsch et al. patent described one capacitor ferroelectric memory cell having a reference cell, as reproduced in
FIG. 1
of the present document.
Referring to
FIG. 1
, a simplified one-capacitor ferroelectric memory cell
10
with an associated reference cell
12
is illustrated. Memory cell
10
includes a single switching transistor
15
and a ferroelectric capacitor
20
. Generally, to form an array of memory cells, additional memory cells are provided in a first horizontal row that includes memory cell
10
. The first row containing memory cell
10
has a WORD line
22
and a PLATE line
23
associated therewith. Additional horizontal rows (not shown) parallel therewith and each including a WORD line and a plate line are provided. Also, memory cell
10
is arranged in a first vertical column with additional memory cells (not shown) having a common BIT line pair
24
,
25
connected to a sense amplifier, or latch,
30
. Additional columns, each having common BIT line pairs and sense amplifiers are also provided in the array. BIT line
24
is connected to memory cell
10
, and to all other memory cells in the first column while BIT line
25
is connected to reference cell
12
.
WORD line
22
is connected to the gate of switching transistor
15
, and to the gate of switching transistors in each other memory cell in the first row. PLATE line
23
, is connected to one plate of ferroelectric capacitor
20
, the other plate of which is connected to the drain of switching transistor
15
. PLATE line
23
is similarly connected to other memory cells in the first row. The source of switching transistor
15
is connected to BIT line
24
and the sources of switching transistors in all other memory cells in the first column are connected to BIT line
24
.
Reference cell
12
is associated with all of the memory cells in the first column. As such, a single reference cell can be used with any memory cell, which allows the use of a single reference cell with each column. Referring to
FIG. 1
of the present document, a reference cell
12
has a voltage dumping structure where a reference voltage is supplied onto a bitline BITC. The reference cell
12
includes a first switching transistor
35
, a second switching transistor
37
, and a reference capacitor
39
. A gate of the first switching transistor
35
is connected to an REF WORD line
40
, and a source of which is connected to BITC line
25
.
One plate of the reference capacitor
39
is connected to a ground, and the other plate is connected to a drain of the first switching transistor
35
and to a source of the second switching transistor
37
. A drain of the second switching transistor
37
is connected to a reference potential REF INIT, and a gate of which is connected to receive a reference initial signal,
Using the voltage dumping structure, a reference voltage of DC level is generated to solve the foregoing problem that occurs upon using a reference cell having a ferroelectric capacitor. However, a memory cell is afflicted with a phenomenon that a hysteresis loop of a ferroelectric capacitor changes with time.
Referring to
FIG. 2A
, a polarization state of a ferroelectric capacitor changes according to an initially ideal curve (indicated by a solid line). And, the ferroelectric capacitor will change according to a deteriorated or collapsing hysteresis curve (indicated by a dotted line) in a predetermined time.
As can be seen in
FIG. 2B
, a polarization level of a ferroelectric capacitor storing data “1” is reduced from point C to point ‘C’. On the other hand, the polarization level of a ferroelectric capacitor storing data“0” is increased from point A to point ‘A’.
Referring to
FIG. 2B
, which illustrates changes of voltages induced on a bitline with respect to time as the device ages, there is a difference between a reduction ratio of a bitline voltage corresponding to date“1” (curve D
1
) and that of a bitline voltage corresponding to date“0” (curve D
0
). So an optimal sensing margin cannot be secured in a predetermined time.
More particularly, here, the optimal sensing margin means that a sensing margin MD
1
between a bitline voltage corresponding to date“1” and a reference voltage VREF and a sensing margin MD
2
between a bitline voltage corresponding to data“0” and the reference voltage VREF are greater the or identical to required margin. For example, if the sensing margin MD
1
is smaller than a required margin and the sensing margin MD
0
is greater than the required margin at a time t

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