Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1995-12-22
1998-11-24
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
279128, H02N 1300
Patent
active
058416234
ABSTRACT:
A chuck for processing a substrate includes a chuck body having a dielectric layer, the dielectric layer including a substrate receiving surface, the substrate receiving surface being at least as large as a substrate to be processed on the chuck. The chuck further includes an electrode buried in the chuck body, the electrode being larger than the substrate receiving surface such that edges of a radio frequency field generated by the electrode are all disposed beyond the substrate receiving surface. A method for depositing a film in a radio frequency biased plasma chemical deposition system is also disclosed.
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Denison Dean R.
Harrus Alain
Pirkle David R.
Fleming Fritz
Lam Research Corporation
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