Chrome mask etch

Details Chrome mask etch Chrome mask etch

1987-04-06

1988-09-27

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430323, 430324, 430330, 156643, 156646, 1566571, G03C 500

Patent

active

047741643

ABSTRACT:
Patterning a chrome mask with PBS (polybutenesulfone) photoresist is enabled in a plasma reactor by covering the patterned photoresist with a glass layer, planarizing the glass layer, etching the photoresist and then etching the chrome mask. The pattern transferred to the chrome mask is the negative or inverse of the pattern in the photoresist layer.

REFERENCES:
patent: 3567447 (1971-03-01), Chand
patent: 4489146 (1984-12-01), Bock et al.
patent: 4634645 (1987-01-01), Matsuda et al.

Affiliated with

Also associated with

Rating

Chrome mask etch does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chrome mask etch, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chrome mask etch will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2397637