Chemical vapor deposition process

Details Chemical vapor deposition process Chemical vapor deposition process

1984-10-02

1985-10-15

Morgenstern, Norman

Coating processes

Coating by vapor, gas, or smoke

427255, C23C 1100

Patent

active

045474044

ABSTRACT:
A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.

REFERENCES:
patent: 3594242 (1971-07-01), Burd et al.
patent: 3900597 (1975-08-01), Churma et al.
patent: 4098923 (1978-07-01), Alberti et al.
patent: 4256053 (1981-03-01), Dozier
patent: 4309240 (1982-01-01), Zateres
patent: 4341818 (1982-07-01), Adams et al.
patent: 4348580 (1982-09-01), Drexel

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