Chemical vapor deposition of tungsten(W-CVD) process for growing

Details Chemical vapor deposition of tungsten(W-CVD) process for growing Chemical vapor deposition of tungsten(W-CVD) process for growing

1996-12-09

2000-02-29

Niebling, John F.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438674, 438656, 438672, 438675, H01L 2144

Patent

active

060308931

ABSTRACT:
The present invention is a chemical vapor deposition of tungsten(W-CVD)process for growing low stress and void free interconnect. The method of this invention utilizes two steps W-CVD process by two chambers. The first step, filling tungsten metal completely in the contact hole, is performed in the first chamber. The second step, forming a tungsten layer for interconnect, is performed in the second chamber. Because of using two different chambers, the method of this invention can adjust the temperature of the process and the gas flow of the WF.sub.6 vapor of the process for different required the two steps. The second step of chemical vapor deposition of tungsten by adjusting the temperature and the gas flow has reduced greatly the stress of the second conductive layer. Moreover, the first step of chemical vapor deposition of tungsten by adjusting the temperature and the gas flow prevents voids in the contact hole or in the via hole. Thus, growing low stress and voids free interconnect is accomplished by the method of this invention.

REFERENCES:
patent: 5443995 (1995-08-01), Nulman
Wolf, S. and Tauber, R.N., Silicon Processing for the VLSI Era, Lattice Press, pp. 399-404, 1986.

Affiliated with

Also associated with

Rating

Chemical vapor deposition of tungsten(W-CVD) process for growing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapor deposition of tungsten(W-CVD) process for growing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition of tungsten(W-CVD) process for growing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-682609