Chemical vapor deposition method

Details Chemical vapor deposition method Chemical vapor deposition method

2007-06-12

2007-06-12

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S255230, C117S084000, C118S719000

Reexamination Certificate

active

10912878

ABSTRACT:
Methods of chemical vapor deposition include providing a deposition chamber defined at least in part by at least one of a chamber sidewall and a chamber base wall. At least one process chemical inlet to the deposition chamber is included. A substrate is positioned within the chamber and a process gas is provided over the substrate effective to deposit material onto the substrate. While providing the process gas, a purge gas is emitted into the chamber from a plurality of purge gas inlets comprised by at least one chamber wall surface. The purge gas inlets are separate from the at least one process chemical inlet and the emitting forms an inert gas curtain over the chamber wall surface.

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