Chemical vapor deposition apparatus

Details Chemical vapor deposition apparatus Chemical vapor deposition apparatus

1982-08-27

1985-10-08

Morgenstern, Norman

Coating apparatus

Gas or vapor deposition

Multizone chamber

118724, 118725, 118733, 118728, C23C 1308

Patent

active

045453276

ABSTRACT:
A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.

REFERENCES:
patent: 3293074 (1966-12-01), Nickl
patent: 3456616 (1969-07-01), Gleim et al.
patent: 3704987 (1972-12-01), Arndt et al.
patent: 3830194 (1974-08-01), Benzing et al.
patent: 4098923 (1978-07-01), Alberti et al.
patent: 4309240 (1982-01-01), Zaferes
patent: 4348580 (1982-09-01), Drexel

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