Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-07-22
1999-11-02
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430919, 430921, G03C 1492
Patent
active
059767600
ABSTRACT:
Proposed is a novel chemical-sensitization resist composition capable of giving a positively or negatively patterned resist layer of excellent pattern resolution and cross sectional profile of the patterned resist layer with high sensitivity. Characteristically, the resist composition is formulated, as combined with a resinous ingredient which is subject to changes in the solubility behavior in an alkaline developer solution by interaction with an acid, with a specific oximesulfonate compound as the radiation-sensitive acid-generating agent represented by the general formula
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Hada Hideo
Kaneko Fumitake
Nakayama Toshimasa
Oomori Katsumi
Sato Kazufumi
Ashton Rosemary
Baxter Janet
Tokyo Ohka Kogyo Co. Ltd.
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