Chemical processing method, and method of manufacturing...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching

Reexamination Certificate

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C438S906000, C438S974000

Reexamination Certificate

active

06992016

ABSTRACT:
Air trapped in a blind hole during processing of the blind hole with a liquid is eliminated by circulating the liquid along a surface-to-be-processed in substantially a single direction at all times and by setting a velocity gradient of the liquid over the surface to at least 300/second.

REFERENCES:
patent: 4468127 (1984-08-01), Agosta
patent: 5143018 (1992-09-01), Meakin
patent: 5292373 (1994-03-01), Arita et al.
patent: 5948173 (1999-09-01), Huh et al.
patent: 6139755 (2000-10-01), Marte et al.
patent: 5-21413 (1993-01-01), None
patent: 5-299406 (1993-11-01), None

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