Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2006-01-31
2006-01-31
Nelms, David (Department: 2818)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C438S906000, C438S974000
Reexamination Certificate
active
06992016
ABSTRACT:
Air trapped in a blind hole during processing of the blind hole with a liquid is eliminated by circulating the liquid along a surface-to-be-processed in substantially a single direction at all times and by setting a velocity gradient of the liquid over the surface to at least 300/second.
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Kinugawa Masaru
Kosaki Katsuya
Nakamoto Takeo
Hoang Quoc
Mitsubishi Denki & Kabushiki Kaisha
Nelms David
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