Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-10-23
1999-09-21
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430325, 430919, 430921, G03C 1492
Patent
active
059552417
ABSTRACT:
The present invention provides a chemical-amplification-type negative resist composition and a method for forming a negative resist pattern using the same. The chemical-amplification-type negative resist composition comprises (A) an alkali-soluble resin, (B) an acid-generating agent, and (C) a compound capable of causing crosslinking reaction in the presence of an acid, wherein the ingredient (A) is a mixture comprising (i) a copolymer which comprises constitutional repeating units of a hydroxystyrene type, has a weight average molecular weight of 2,000 to 4,000, and has a ratio of the weight average molecular weight to the number average molecular weight falling within 1.0 to 2.0; and (ii) a hydroxystyrene homopolymer, and wherein the dissolution rate of the ingredient (A) at 23.degree. C. in a 2.38% by weight tetramethylammonium hydroxide aqueous solution falls within 80 to 300 nm/s.
REFERENCES:
patent: 5227276 (1993-07-01), Roeschert et al.
patent: 5547812 (1996-08-01), Collins et al.
patent: 5595855 (1997-01-01), Padmanaban et al.
Ishikawa Kiyoshi
Nakayama Toshimasa
Sato Mitsuru
Sugeta Yoshiki
Yamazaki Hiroyuki
Ashton Rosemary
McPherson John A.
Tokyo Ohka Kogyo Co. Ltd.
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