Charged particle beam writing method and apparatus

Details Charged particle beam writing method and apparatus Charged particle beam writing method and apparatus

2006-11-24

2009-10-13

Vanore, David A (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S492100, C250S492200, C250S492220, C250S492300

Reexamination Certificate

active

07601968

ABSTRACT:
A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any one of the plurality of deflectors controls deflection of a charged particle beam of a shot different from a shot which is controlled in deflection by another deflector in the same period.

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patent: 2006/0255284 (2006-11-01), Hill et al.
patent: 63-92020 (1988-04-01), None
patent: 0100395 (1996-02-01), None

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