Charged particle beam transfer method

Details Charged particle beam transfer method Charged particle beam transfer method

1999-05-07

2000-10-31

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430942, G03C 500

Patent

active

061400211

ABSTRACT:
This invention provides the charged particle beam transfer method, which can control adverse effect of distortion or blur that arises from the space charge effect due to the non-uniform pattern density to a minimum.
A pattern formed on reticle is raster or step-and-repeat scanned with a charged particle beam and is illuminated in consecutive order, and a pattern image of a sub-field, which is illuminated, is to be formed on a certain position of a radiation sensitive substrate. On the radiation sensitive substrate whole pattern is projected through stitching the said pattern image. The pattern is to be divided into plural areas A and B which differ in pattern density one another, and the above-described scan boundary is made to coincide with the boundary of these plural areas.

REFERENCES:
patent: 5798194 (1998-08-01), Nakasuji
patent: 5817442 (1998-10-01), Okino
patent: 5876881 (1999-03-01), Kawata
patent: 5989753 (1999-11-01), Okino

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