Charged particle beam pattern-transfer method utilizing non-unif

Details Charged particle beam pattern-transfer method utilizing non-unif Charged particle beam pattern-transfer method utilizing non-unif

1998-12-01

2000-12-19

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430942, G03C 500

Patent

active

061625817

ABSTRACT:
Charged-particle-beam pattern-transfer methods and apparatus are disclosed. Circuit patterns on a mask are divided into a plurality of fields, each field including respective connection ends. Fields that are to be adjacent as transferred to a substrate include a common portion of the circuit pattern in their respective connection ends. The common portions are projected onto the substrate to substantially overlap. The connection ends are illuminated by an image of a shaping aperture image that is illuminated with a charged-particle beam. The shaping-aperture image can be scanned across the fields so that wafer areas corresponding to the connection ends are exposed during exposure of the connecting adjacent fields and so that the dose received by the wafer is substantially uniform. The shaping-aperture image can be vibrated in a direction perpendicular to a scanning direction to illuminate connection ends. The vibration provides uniform dose on the wafer in areas corresponding to the connection ends. With such methods, circuit patterns are connected, even if the patterns from the fields are slightly offset.

REFERENCES:
patent: 5798194 (1998-08-01), Nakasuji et al.
patent: 5973333 (1999-10-01), Nakiasuji et al.

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