Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1978-01-18
1979-02-20
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 3700
Patent
active
041409132
ABSTRACT:
A charged-particle beam optical apparatus for the reduction imaging of a mask on a specimen to be examined. The apparatus comprises a beam source for illuminating the mask, a condenser lens system comprising a plurality of lenses generating a ray bundle which strikes the mask as a probe, a beam deflection system located ahead of the last of the condenser lenses in the direction of the beam path, and a projection lens system including a long focal length intermediate lens and a short focal length imaging lens. The intermediate and imaging lenses are spaced apart by a distance which is equal to the sum of their focal lengths, and the mask is located in the front focal plane of the intermediate lens. The improvement of the invention comprises the provision of means for generating a probe in the form of a ray bundle comprising a plurality of rays which are at least approximately parallel to each other and which simultaneously illuminate a partial two-dimensional surface area of the mask.
REFERENCES:
patent: 3491236 (1970-01-01), Newberry
patent: 3745385 (1973-07-01), Firtz et al.
patent: 3876883 (1975-04-01), Broers et al.
"Electron-Projection Microfabrication System," Heritage J. Vac. Sci. Tech., vol. 12, No. 6, Nov. 1975, pp. 1135-1140.
Anger Klaus
Lischke Burkhard
Muller Karl-Heinz
Oelmann Andreas
Anderson Bruce C.
Siemens Aktiengesellschaft
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