Charged particle beam application system

Details Charged particle beam application system Charged particle beam application system

2005-09-09

2008-08-05

Sherry, Michael J (Department: 2836)

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

Reexamination Certificate

active

07408760

ABSTRACT:
During the writing operation, the wafer potential is dynamically detected and corrected. By doing so, the positional accuracy of the circuit patterns written on a wafer can be improved. After a contact resistance between a wafer and a earth pin is measured, the current flowing from the wafer to the ground potential via the earth pin is measured. Then, based on the measurement result, the potential difference is given between the wafer and the ground potential.

REFERENCES:
patent: 5148036 (1992-09-01), Matsugu et al.
patent: 5179498 (1993-01-01), Hongoh et al.
patent: 5225892 (1993-07-01), Matsugu et al.
patent: 6716301 (2004-04-01), Kanno et al.
patent: 2005/0016685 (2005-01-01), Emoto et al.
patent: 11-111599 (1999-04-01), None
patent: 2001-257158 (2001-09-01), None
J. Phys. E. Sci. Instrum., vol. 14, 1981, “Deflection errors due to sample potential in electron beam lithography machine”, M. Miyazaki et al, pp. 194-195.

Affiliated with

Also associated with

Rating

Charged particle beam application system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam application system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam application system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4004268