Charged beam lithography method

Details Charged beam lithography method Charged beam lithography method

1996-08-26

1999-03-23

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430942, G03C 500

Patent

active

058857478

ABSTRACT:
A charged beam lithography method comprising the method steps shown in the Figure below.

REFERENCES:
patent: 5305225 (1994-04-01), Yamaguchi et al.
patent: 5458998 (1995-10-01), Takekuma et al.
patent: 5565285 (1996-10-01), Takekuma et al.
Sohn et al., "Comparative Study on Optical Proximity Effect Correction iwth Various Types of Dummy Patterns and its Application to DRAM Devices", Technical Rpt. of Samsung Elec.

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