Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1994-07-19
1996-08-20
Fleming, Fritz M.
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
H02N 1300
Patent
active
055484700
ABSTRACT:
An electrostatic chuck (ESC) provides increased temperature uniformity and adjustment capability of the surface of a wafer or wafer-like workpiece during processing, for example, in an electron-cyclotron-resonance chemical vapor deposition (ECR-CVD) reactor. Temperature uniformity is achieved through an improved pattern of grooves in the face of the ESC which allows an inert gas to be contained between the ESC and a wafer held thereby even at high levels of vacuum. The ESC is adapted for a particular desired temperature range by choice of surface roughness of the remaining areas of the face of the ESC. Adjustability within that range is achieved by variation of the electrostatic voltage by which a wafer is held against the chuck face.
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Husain Anwar
Kotecki David E.
Lassig Stephan E.
Olson Kurt A.
Ricci Anthony J.
Fleming Fritz M.
International Business Machines - Corporation
Petraske Eric W.
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