Chamber for wafer cleaning and method for making the same

Details Chamber for wafer cleaning and method for making the same Chamber for wafer cleaning and method for making the same

2008-07-01

2008-07-01

Markoff, Alexander (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With spray or jet supplying and/or applying means

C134S182000, C134S200000, C134S05600D, C134S902000

Reexamination Certificate

active

07392815

ABSTRACT:
A wafer processing chamber “chamber” is provided. Broadly speaking, the chamber allows a fluid flow and a fluid pressure within the chamber to be controlled in a variable manner. More specifically, the chamber utilizes removable plates that can be configured to control the fluid flow and the fluid pressure in an inner volume within the chamber. Also, the removable plates can be used to separate the inner volume within the chamber from an outer volume within the chamber. In this manner, the removable plates can be used to create a pressure differential between the inner volume within the chamber and the outer volume within the chamber. A lower pressure in the outer volume within the chamber requires less outer chamber strength to withstand the lower pressure. A lower outer chamber strength requirement translates into an overall decrease in chamber size.

REFERENCES:
patent: 5936829 (1999-08-01), Moslehi
patent: 6024631 (2000-02-01), Piper
patent: 6032997 (2000-03-01), Elliott et al.
patent: 6239038 (2001-05-01), Wen
patent: 6279976 (2001-08-01), Ball
patent: 6398926 (2002-06-01), Mahneke
patent: 6722642 (2004-04-01), Sutton et al.
patent: 6921456 (2005-07-01), Biberger et al.
patent: 2003/0037457 (2003-02-01), Bailey et al.
patent: 2003/0047202 (2003-03-01), Worm
patent: 2003/0047551 (2003-03-01), Worm et al.
patent: 0408350 (1991-01-01), None
patent: 0463853 (1992-01-01), None
patent: 0825279 (1998-02-01), None
patent: WO-00/05750 (2000-02-01), None
patent: WO-02/059947 (2002-08-01), None

Affiliated with

Also associated with

Rating

Chamber for wafer cleaning and method for making the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chamber for wafer cleaning and method for making the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chamber for wafer cleaning and method for making the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2781421