Chamber for uniform substrate heating

Details Chamber for uniform substrate heating Chamber for uniform substrate heating

2006-02-14

2006-02-14

Fuqua, Shawntina (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S405000, C219S411000, C118S724000, C118S725000, C118S050100, C392S416000, C392S418000

Reexamination Certificate

active

06998579

ABSTRACT:
In a first aspect, a first apparatus is provided for heating substrates. The first apparatus includes (1) a chamber having a bottom portion and a top portion; (2) a plurality of heated supports disposed within the chamber to support at least two substrates thereon; and (3) a heater disposed within the chamber between a sidewall of the chamber and the plurality of substrate supports and having an edge region and a center region. The heater is adapted to produce more heat within the edge region than within the center region of the heater. Numerous other aspects are provided.

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