Chamber for uniform heating of large area substrates

Details Chamber for uniform heating of large area substrates Chamber for uniform heating of large area substrates

2006-04-03

2008-10-28

Pelham, Joseph M (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S392000, C219S398000, C118S719000, C118S724000, C118S725000

Reexamination Certificate

active

07442900

ABSTRACT:
Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an apparatus for thermal processing large area substrates includes a chamber having a plurality of processing zones disposed therein that are coupled to a lift mechanism. The lift mechanism is adapted to vertically position the plurality of processing zones within the chamber. Each processing zone further includes an upper heated plate, a lower heated plate adapted to support a first substrate thereon and an unheated plate adapted to support a second substrate thereon, wherein the unheated plate is disposed between the upper and lower heated plates.

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