Chamber elements defining a movable internal chamber

Details Chamber elements defining a movable internal chamber Chamber elements defining a movable internal chamber

2005-05-31

2005-05-31

Mills, Gregory (Department: 1763)

Coating apparatus

Gas or vapor deposition

Work support

C118S719000, C118S728000, C118S729000, C156S345510, C156S345540, C156S345550, C156S345310, C156S345320, C414S939000

Reexamination Certificate

active

06899765

ABSTRACT:
A process chamber for processing or inspecting a substrate such as a semiconductor wafer and the like includes a internal chamber employing dynamic seals at the interface of relatively moving elements. In one embodiment, the internal chamber has a first element, such as a lid or cover, and a second element, such as the body of the chamber. The first element and the second element meet at the interface. The internal chamber may further include a substrate support, mounted inside the internal chamber, supporting a substrate. A first movement system may produce at least one type of relative movement between the first element and the second element. A second movement system may produce second relative movement between the second element and the substrate support. The resulting structure allows movement of the chamber, while maintaining pressure inside the chamber.

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patent: 6409837 (2002-06-01), Hillman
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