Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1994-03-15
1997-10-21
Pascal, Robert
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
156345P, 118723E, 118723R, 21323131, H01L 2130
Patent
active
056800134
ABSTRACT:
Non-bonded ceramic protection is provided for metal surfaces in a plasma processing chamber, particularly heated metal electrode surfaces, in a plasma processing chamber, to prevent or inhibit attack of the heated metal surfaces by chemically aggressive species generated in the plasma during processing of materials, without bonding the ceramic material to the metal surface. In accordance with the invention the ceramic protection material comprises a thin cover material which is fitted closely, but not bonded, to the heated metal. This form of ceramic protection is particularly useful for protecting the surfaces of glow discharge electrodes and gas distribution apparatus in plasma process chambers used for processing semiconductor substrates to form integrated circuit structures. The particular ceramic material used to provide the desired protection from the gaseous species generated by the plasma are selected from the group consisting of aluminum nitride, crystalline aluminum oxide, magnesium fluoride, and sintered aluminum oxide.
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Bercaw Craig A.
Dornfest Charles N.
Fodor Mark A.
Tomosawa Hiroyuki Steven
White John M.
Applied Materials Inc.
Kinkead Arnold
Pascal Robert
Taylor John P.
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