Heat exchange – Heating and cooling – Heating and cooling of the same material
Reexamination Certificate
2007-03-12
2011-12-27
Ford, John (Department: 3784)
Heat exchange
Heating and cooling
Heating and cooling of the same material
C165S080100, C165S080200, C165S080400, C165S080500, C324S750030, C324S750080, C219S444100, C118S724000, C118S725000, C156S345520, C156S345530, C204S298150
Reexamination Certificate
active
08082977
ABSTRACT:
A mounting apparatus includes a surface plate; a temperature control unit integrated with the surface plate; and a bottom plate integrated with the temperature control unit via a heat insulation ring, wherein a temperature of a target object held on the surface plate is capable of being controlled and the surface plate is formed of ceramic. The surface plate and the temperature control unit are coupled to each other by a first coupling member at each portion thereof except for each peripheral portion thereof such that the peripheral portion of the surface plate being not coupled thereto. The peripheral portion of the temperature control unit is coupled to the heat insulation ring by a second coupling member.
REFERENCES:
patent: 4559244 (1985-12-01), Kasprzyk et al.
patent: 5716133 (1998-02-01), Hosokawa et al.
patent: 6605955 (2003-08-01), Costello et al.
patent: 7331097 (2008-02-01), Stone et al.
patent: 7425838 (2008-09-01), Itakura et al.
patent: 7518358 (2009-04-01), Dunklee
patent: 2005/0011768 (2005-01-01), Stone et al.
patent: 05036818 (1993-02-01), None
patent: 2002203664 (2002-07-01), None
Akaike Yutaka
Nagasaka Munetoshi
Ford John
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tokyo Electron Limited
LandOfFree
Ceramic mounting for wafer apparatus with thermal expansion... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ceramic mounting for wafer apparatus with thermal expansion..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ceramic mounting for wafer apparatus with thermal expansion... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4253423