Catadioptric reduction lens

Details Catadioptric reduction lens Catadioptric reduction lens

2006-11-14

2006-11-14

Dunn, Drew A. (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S726000

Reexamination Certificate

active

07136220

ABSTRACT:
A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.

REFERENCES:
patent: 4953960 (1990-09-01), Williamson
patent: 5052763 (1991-10-01), Singh et al.
patent: 5212593 (1993-05-01), Williamson et al.
patent: 5402267 (1995-03-01), Fuerter et al.
patent: 5537260 (1996-07-01), Williamson
patent: 5583696 (1996-12-01), Takahashi
patent: 5691802 (1997-11-01), Takahashi
patent: 5694241 (1997-12-01), Ishiyama et al.
patent: 5742436 (1998-04-01), Furter
patent: 5771125 (1998-06-01), Ishiyama
patent: 5808805 (1998-09-01), Takahashi
patent: 5835284 (1998-11-01), Takahashi et al.
patent: 5861997 (1999-01-01), Takahashi
patent: 5969882 (1999-10-01), Takahashi
patent: 5999333 (1999-12-01), Takahashi
patent: 6081382 (2000-06-01), Omura
patent: 6101047 (2000-08-01), Chung et al.
patent: 6108140 (2000-08-01), Hashimoto et al.
patent: 6118596 (2000-09-01), Hashimoto et al.
patent: 6208473 (2001-03-01), Omura
patent: 6377388 (2002-04-01), Sakata et al.
patent: 6624880 (2003-09-01), Sandstrom et al.
patent: 6707532 (2004-03-01), Suzuki
patent: 6717746 (2004-04-01), Epple et al.
patent: 42 03 464 (1992-08-01), None
patent: 0 350 955 (1990-01-01), None
patent: 0 475 020 (1992-03-01), None
patent: 0 602 923 (1994-06-01), None
patent: 0 902 329 (1999-03-01), None
patent: 0 989 434 (2000-03-01), None
patent: 1 102 100 (2001-05-01), None
Saburo Nonotaki et al.: “Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology;” Marcel Dekker, Inc., New York, 1998.

Affiliated with

Also associated with

Rating

Catadioptric reduction lens does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Catadioptric reduction lens, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Catadioptric reduction lens will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3628665