Catadioptric optical system and exposure apparatus having...

Details Catadioptric optical system and exposure apparatus having... Catadioptric optical system and exposure apparatus having...

2006-01-10

2006-01-10

Sikder, Mohammad (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S355000, C359S364000

Reexamination Certificate

active

06985286

ABSTRACT:
A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

REFERENCES:
patent: 4779966 (1988-10-01), Friedman
patent: 5052763 (1991-10-01), Singh et al.
patent: 5323263 (1994-06-01), Schoenmakers
patent: 5592329 (1997-01-01), Ishiyama et al.
patent: 5668673 (1997-09-01), Suenaga et al.
patent: 5689377 (1997-11-01), Takahashi
patent: 5691802 (1997-11-01), Takahashi
patent: 5694241 (1997-12-01), Ishiyama et al.
patent: 5805334 (1998-09-01), Takahashi
patent: 5844728 (1998-12-01), Hashimoto et al.
patent: 5861997 (1999-01-01), Takahashi
patent: 5999333 (1999-12-01), Takahashi
patent: 6392822 (2002-05-01), Takahashi
patent: 197 26 058 (1998-02-01), None
patent: 0 736 789 (1996-09-01), None
patent: 0770 895 (1997-02-01), None
patent: 8-62502 (1994-08-01), None

Affiliated with

Also associated with

Rating

Catadioptric optical system and exposure apparatus having... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Catadioptric optical system and exposure apparatus having..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Catadioptric optical system and exposure apparatus having... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3583521