Coating apparatus – Work holders – or handling devices
Reexamination Certificate
2006-09-08
2010-10-26
Tadesse, Yewebdar T (Department: 1713)
Coating apparatus
Work holders, or handling devices
C118S050000, C118S503000
Reexamination Certificate
active
07819079
ABSTRACT:
The present invention generally provides an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that is easily configurable, has an increased system throughput, increased system reliability, improved device yield performance, a more repeatable wafer processing history (or wafer history), and a reduced footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, and then certain portions of the photosensitive material are removed in a developing process completed in the cluster tool.
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Armer Helen R.
Carlson Charles
Englhardt Eric A.
Hongkham Steve
Hudgens Jeffrey C.
Applied Materials Inc.
Patterson & Sheridan LLP
Tadesse Yewebdar T
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