Carrier head for chemical mechanical polishing a substrate

Abrading – Abrading process – Glass or stone abrading

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

451285, 451286, 451282, 451288, 451289, 451388, 451398, B24B 100

Patent

active

061590797

ABSTRACT:
A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane with a lip portion to engage a substrate to form a seal for improved vacuum-chucking.

REFERENCES:
patent: 4669915 (1987-06-01), Shatto, Jr.
patent: 4918869 (1990-04-01), Kitta
patent: 5193316 (1993-03-01), Olmstead
patent: 5205082 (1993-04-01), Shendon et al.
patent: 5423716 (1995-06-01), Strasbaugh
patent: 5449316 (1995-09-01), Strasbaugh
patent: 5584751 (1996-12-01), Kobayashi et al.
patent: 5624299 (1997-04-01), Shendon
patent: 5643053 (1997-07-01), Shendon
patent: 5643061 (1997-07-01), Jackson et al.
patent: 5759918 (1998-06-01), Hoshizaki et al.
patent: 5803799 (1998-09-01), Volodarsky et al.
patent: 5851140 (1998-12-01), Barns et al.
patent: 5879220 (1999-03-01), Hasegawa et al.
patent: 5916015 (1999-06-01), Natalicio
patent: 5941758 (1999-08-01), Mack
patent: 5957751 (1999-09-01), Govzman et al.
patent: 5964653 (1999-10-01), Perlov et al.
patent: 5993302 (1999-11-01), Chen et al.
patent: 6083089 (2000-07-01), Breivogel et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Carrier head for chemical mechanical polishing a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Carrier head for chemical mechanical polishing a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Carrier head for chemical mechanical polishing a substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-211196

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.