Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2009-05-01
2011-11-22
Chu, John (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S910000, C526S282000
Reexamination Certificate
active
08062831
ABSTRACT:
Carboxyl-containing lactone compounds having formula (1) are novel wherein R1is H, F, methyl or trifluoromethyl, R2and R3are H or monovalent hydrocarbon groups, or R2and R3may together form an aliphatic ring, W is CH2, O or S, k1is an integer of 0 to 4, and k2is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
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Hasegawa Koji
Kinsho Takeshi
Nishi Tsunehiro
Shinachi Satoshi
Tachibana Seiichiro
Birch & Stewart Kolasch & Birch, LLP
Chu John
Shin-Etsu Chemical Co. , Ltd.
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