Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1998-11-04
2000-09-12
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430311, 430512, 430514, 430942, 430945, 430950, 427554, G03C 500
Patent
active
061176184
ABSTRACT:
In one embodiment, the present invention relates to a method of making a carbonized antireflection coating involving the steps of depositing a polymer layer on a semiconductor substrate; and carbonizing at least a portion of the polymer layer in an inert atmosphere to provide the carbonized antireflection coating. In another embodiment, the present invention relates to a method of improving critical dimensional control during lithography, involving the steps of providing a semiconductor substrate; depositing a polymer layer on the semiconductor substrate; carbonizing at least a portion of the polymer layer in an inert atmosphere to provide a carbonized antireflection coating; depositing a photoresist over the carbonized antireflection coating; and patterning the photoresist.
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patent: 5137751 (1992-08-01), Burgess et al.
patent: 5437961 (1995-08-01), Yano et al.
IBM Technical Disclosure Bulletin, "Carbonized Resist As Directly-Patternable Mask Absorber", Mar. 1988, vol. 30, issue 10, p 402-406, NN8803402.
Rangarajan Bharath
Singh Bhanwar
Templeton Michael
Yedur Sanjay
Advanced Micro Devices , Inc.
Young Christopher G.
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