Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-08-22
2006-08-22
Lee, Hsien-Ming (Department: 2823)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S691000, C438S800000, C438S626000
Reexamination Certificate
active
07094679
ABSTRACT:
Method and system for fabricating an electrical interconnect capable of supporting very high current densities (106–1010Amps/cm2), using an array of one or more carbon nanotubes (CNTs). The CNT array is grown in a selected spaced apart pattern, preferably with multi-wall CNTs, and a selected insulating material, such as SiOwor SiuNv, is deposited using CVD to encapsulate each CNT in the array. An exposed surface of the insulating material is planarized to provide one or more exposed electrical contacts for one or more CNTs.
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Li Jun
Meyyappan Meyya
Lee Hsien-Ming
Padilla Robert M.
Schipper John F.
The United States of America as represented by the Administrator
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