Carbon nanotube gate field effect transistor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having junction gate

Reexamination Certificate

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C438S196000, C438S587000, C438S591000

Reexamination Certificate

active

06852582

ABSTRACT:
The present invention generally relates to an apparatus and method of carbon nanotube (CNT) gate field effect transistor (FET), which is used to replace the current metal gate of transistor for decreasing the gate width greatly. The carbon nanotube has its own intrinsic characters of metal and semiconductor, so it can be the channel, connector or next-level gate of transistor. Furthermore, the transistor has the structure of exchangeable source and drain, and can be defined the specificity by outside wiring.

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Zhang et al., “A Novel Local Bottom-gate Carbon Nanotube Field Effect Transistor on SOI”, Sep. 29, 2003, SOI Conferenc 2003 IEEE international, pp. 63 and 64.*
Wind et al., “Carbon Nanotube Devices for Future Nanoelectronics”, 8/12-14/03, Nanotechnology 2003. IEEE-NANO 2003. 2003 Third IEEE conference, vol. 1, pp. 236-239.*
Wong et al., “Carbon Nanotube Field Effect Transistors—Fabrication, Device Physics, and Circuit Implications”, Feb. 12, 2003, Solid State Circuits Conference, 2003. Digest of Technical Pappers. IEECC. 2003 IEEE International, pp. 370-380.

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