Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2009-08-24
2011-11-22
Pham, Thanhha (Department: 2894)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S003000, C438S785000, C257SE21664
Reexamination Certificate
active
08062943
ABSTRACT:
A capacitor with zirconium oxide and a method for fabricating the same are provided. The method includes: forming a storage node; forming a multi-layered dielectric structure on the storage node, the multi-layered dielectric structure including a zirconium oxide (ZrO2) layer and an aluminum oxide (Al2O3) layer; and forming a plate electrode on the multi-layered dielectric structure.
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Stesmans, A. et al.; “Paramagnetic defects in annealed ultrathin layers of SiOx, Al2O3, and Zr02on(100)Si”; vol. 85, No. 17; pp. 3792-3794; 2004 American Insititute of Physics.
Blakely & Sokoloff, Taylor & Zafman
Hynix Semiconductor
Pham Thanhha
LandOfFree
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