Capacitor with zirconium oxide and method for fabricating...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S003000, C438S785000, C257SE21664

Reexamination Certificate

active

08062943

ABSTRACT:
A capacitor with zirconium oxide and a method for fabricating the same are provided. The method includes: forming a storage node; forming a multi-layered dielectric structure on the storage node, the multi-layered dielectric structure including a zirconium oxide (ZrO2) layer and an aluminum oxide (Al2O3) layer; and forming a plate electrode on the multi-layered dielectric structure.

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Stesmans, A. et al.; “Paramagnetic defects in annealed ultrathin layers of SiOx, Al2O3, and Zr02on(100)Si”; vol. 85, No. 17; pp. 3792-3794; 2004 American Insititute of Physics.

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