Calculation system for inverse masks

Details Calculation system for inverse masks Calculation system for inverse masks

2007-01-08

2009-06-23

Garbowski, Leigh Marie (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07552416

ABSTRACT:
A system for calculating mask data to create a desired layout pattern on a wafer reads all or a portion of a desired layout pattern. Mask data having pixels with transmission values is defined along with corresponding optimal mask data pixel transmission values. An objective function is defined that compares image intensities as would be generated on a wafer with an optimal image intensity at a point corresponding to a pixel. The objective function is minimized to determine the transmission values of the mask pixels that will reproduce the desired layout pattern on a wafer.

REFERENCES:
patent: 7266803 (2007-09-01), Chou et al.
patent: 2007/0006113 (2007-01-01), Hu et al.
Granik, “Source optimization for image fidelity and throughput,” 2004 Society of Photo-Optical Instrumentation Engineers, pp. 509-522.
Granik, “Illuminator Optimization Methods in Microlithography,” 2004 Proc. of SPIE vol. 5524, pp. 217-229.
Barouch, E., et al., “Illuminator Optimization for Projection Printing,” Proceedings of the SPIE 3679:697-703, Jul. 1999.
Cobb, N., and A. Zakhor, “Fast, Low-Complexity Mask Design,” Proceedings of the SPIE 2440:313-327, May 1995.
Cobb, N.B., “Fast Optical and Process Proximity Correction Algorithms for Integrated Circuit Manufacturing,” Dissertation, University of California at Berkeley, 1998, 123 pages.
Erdmann, A., et al., “Towards Automatic Mask and Source Optimization for Optical Lithography,” Proceedings of the SPIE 5377:646-657, May 2004.
Fienup, J.R., “Phase Retrieval Algorithms: A Comparison,” Applied Optics 21:2758-2769, 1982.
Gamo, H., “Matrix Treatment of Partial Coherence,” Progress in Optics 3:189-332, Amsterdam, 1963.
Gerchberg, R.W., and W.O. Saxton, “A Practical Algorithm for the Determination of Phase From Image and Diffraction Plane Pictures,” Optik 35:237-246, 1972.
Gould, N., “Quadratic Programming: Theory and Methods,” 3rd FNRC Cycle in Math. Programming, Belgium, 2000, pp. 1-67.
Granik, Y., “Solving Inverse Problems of Optical Microlithography,” Proceedings of the SPIE 5754:506-526, 2004.
Granik, Y., “Source Optimization for Image Fidelity and Throughput,” J. Microlith. Microfab. Microsyst. 3:509-522, Oct. 2004.
Han, C.-G., et al., “On the Solution of Indefinite Quadratic Problems Using an Interior-Point Algorithm,” Informatica 3(4):474-496, 1992.
Hwang, C., et al., “Layer-Specific Illumination for Low k1 Periodic and Semi-Periodic DRAM Cell Patterns: Design Procedure and Application,” Proceedings of the SPIE 5377:947-952, May 2004.
Inoue, S., et al., “Optimization of Partially Coherent Optical System for Optical Lithography,” Journal of Vacuum Science and Technology B 10(6):3004-3007, 1992.
Jang, S.-H., et al., “Manufacturability Evaluation of Model-Based OPC Masks,” Proceedings of the SPIE 4889:520-529, 2002.
Liu, Y., and A. Zachor, “Binary and Phase-Shifting Image Design for Optical Lithography,” Proceedings of the SPIE 1463:382-399, 1991.
Liu, Y., and A. Zachor, “Optimal Binary Image Design for Optical Lithography,” Proceedings of the SPIE 1264:401-412, 1990.
Nashold, K., “Image Synthesis—a Means of Producing Superresolved Binary Images Through Bandlimited Systems,” Dissertation, University of Wisconsin, Madison, 1987, pp. 1-127.
Oh, Y.-H., et al., “Optical Proximity Correction of Critical Layers in DRAW Process of 12 um Minimum Feature Size,” Proceedings of the SPIE 4346:1567-1574, 2001.
Oh, Y.-H., et al., “Resolution Enhancement Through Optical Proximity Correction and Stepper Parameter Optimization for 0.12 um Mask Pattern,”Proceedings of the SPIE 3679:607-613, 1999.
Pati, Y.C., and T. Kailath, “Phase-Shifting Masks for Microlithography: Automated Design and Mask Requirements,” Journal of the Optical Society of America A 11(9):2438-2452, Sep. 1994.
Poonawala, A., and P. Milanfar, “Prewarping Techniques in Imaging: Applications in Nanotechnology and Biotechnology,” Proceedings of the SPIE 5674:114-127, 2005.
Qi, L., et. al., “Global Minimization of Normal Quartic Polynomials Based on Global Descent Directions,” SIAM Journal on Optimization 15(1):275-302, 2005.
Rosenbluth, A., et al., “Optimum Mask and Source Patterns to Print a Given Shape,” Journal of Microlithography, Microfabrication, and Microsystems 1:13-30, 2002.
Saleh, B.E.A., “Optical Bilinear Transformation: General Properties,” Optica Acta 26(6):777-799, 1979.
Saleh, B.E.A., and K. Nashold, “Image Construction: Optimum Amplitude and Phase Masks in Photolithography,” Applied Optics 24:1432-1437, 1985.
Sandstrom, T., et. al., “OML: Optical Maskless Lithography for Economic Design Prototyping and Small-Volume Production,” Proceedings of the SPIE 5377:777-797, 2004.
Sayegh, S.I., “Image Restoration and Image Design in Non-Linear Optical Systems,” Dissertation, University of Wisconsin, Madison, 1982, pp. 1-161.
Socha, R., et al., “Contact Hole Reticle Optimization by Using Interference Mapping Lithography (IML),” Proceedings of the SPIE 5446:516-534, Aug. 2004.
Sorensen, D.C., “Newton's Method With a Model Trust Region Modification,” SIAM Journal of Numerical Analysis 19:409-426, 1982.
Takajo, H., et al., “Further Study on the Convergence Property of the Hybrid Input-Output Algorithm Used for Phase Retrieval,” Journal of the Optical Society of America A 16(9):2163-2168, 1999.
Vallishayee, R.R., et al., “Optimization of Stepper Parameters and Their Influence on OPC,” Proceedings of the SPIE 2726:660-665, Jun. 1996.

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