4. Computer-aided design and analysis of circuits and semiconductor
  5. Design of semiconductor mask or reticle

Kyohei Sakajiri

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Calculation system for inverse masks

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Calculation system for inverse masks

Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate

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Method and apparatus for determining phase shifts and trim...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Method and apparatus for determining phase shifts and trim...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate

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Secure exchange of information in electronic design automation

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2187892

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