Bumping process

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C257SE23012

Reexamination Certificate

active

07112523

ABSTRACT:
A method of forming a plurality of bumps over a wafer mainly comprises the steps of providing a wafer having a plurality of bonding pads, forming an adhesive layer on the surface of the wafer to cover the bonding pads, patterning the adhesive layer to expose the bonding pads to form a patterned adhesive layer, forming a barrier layer and a wetting layer on the patterned adhesive layer and the surface of the wafer, removing the barrier layer and the wetting layer not covering the patterned adhesive layer, forming a plurality of bumps on the patterned wetting layer, and reflowing the bumps.

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patent: 6293457 (2001-09-01), Srivastava et al.
patent: 6426281 (2002-07-01), Lin et al.
patent: 6570251 (2003-05-01), Akram et al.
patent: 6596619 (2003-07-01), Wang et al.
patent: 2004/0092092 (2004-05-01), Yang

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