Bonded wafer optical MEMS process

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive

Reexamination Certificate

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C438S455000, C438S739000

Reexamination Certificate

active

07083997

ABSTRACT:
A microelectromechanical system is fabricated from a substrate having a handle layer, a silicon sacrificial layer and a device layer. A micromechanical structure is etched in the device layer and the underlying silicon sacrificial layer is etched away to release the micromechanical structure for movement. One particular micromechanical structure described is a micromirror.

REFERENCES:
patent: 5216490 (1993-06-01), Greiff et al.
patent: 5343064 (1994-08-01), Spangler et al.
patent: 5479042 (1995-12-01), James et al.
patent: 5725729 (1998-03-01), Greiff
patent: 5882532 (1999-03-01), Field et al.
patent: 6021675 (2000-02-01), Seefeldt et al.
patent: 6044705 (2000-04-01), Neukermans et al.
patent: 6121552 (2000-09-01), Brosnihan et al.
patent: 6433401 (2002-08-01), Clark et al.
patent: 198 47 455 (2000-04-01), None
patent: 0 834 759 (1998-08-01), None
“Embedded Interconnect and Electrical Isolation for High-Aspect-Ratio, SOI Inertial Instruments,” Brosnihan et al.; 1997. University of California, Berkeley Sensor & Sctuator Center.
“A Raster—Seanning Full-Motion Video Display Using Polysilicon Micromachined Mirrors”; Conant et al., University of California Berkeley& University of California Davis, Engineering II.
“Integrated Micromachined Scanning Display Systems”; by Hagelin et al., Department of Electrical and Computer Engineering; University of Californian Davis & University of California, Berkeley.
“Stretched-Film Micromirrors For Improved Optical Flatness”; by Nee et al.; University of California, Berkeley Sensor & Actuator Center.

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