Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2006-06-06
2006-06-06
Vu, David (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257S774000
Reexamination Certificate
active
07056820
ABSTRACT:
A bond pad upon which a wirebond interconnection is formed, consisting of a first bond pad layer formed on a chip, and a second bond pad layer formed on the first bond pad layer, wherein the first bond pad layer is more resistant to removal than the second bond pad layer during probe testing, and the first bond pad layer increases resistance to interconnection failure during mechanical testing.
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patent: 6417572 (2002-07-01), Chidambarrao et al.
Cole Stephen P.
Murphy William J.
Waterhouse Barbara A.
Sabo William D.
Schmeiser Olsen & Watts
Vu David
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