Blocker plate bypass to distribute gases in a chemical vapor...

Details Blocker plate bypass to distribute gases in a chemical vapor... Blocker plate bypass to distribute gases in a chemical vapor...

2005-05-16

2009-08-11

Zervigon, Rudy (Department: 1792)

Coating apparatus

Gas or vapor deposition

C156S345330, C156S345340

Reexamination Certificate

active

07572337

ABSTRACT:
Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein. A first gas pathway delivers a first gas through the plurality of apertures in the blocker plate and the gas distribution plate. A bypass gas pathway delivers a second gas through the plurality of feed through passageways in the blocker plate and to areas around the blocker plate prior to the second gas passing through the gas distribution plate.

REFERENCES:
patent: 5360144 (1994-11-01), Slade
patent: 5532190 (1996-07-01), Goodyear et al.
patent: 5725675 (1998-03-01), Fong et al.
patent: 5741363 (1998-04-01), Van Buskirk et al.
patent: 5844195 (1998-12-01), Fairbairn et al.
patent: 5871586 (1999-02-01), Crawley et al.
patent: 5950925 (1999-09-01), Fukunaga et al.
patent: 5968276 (1999-10-01), Lei et al.
patent: 5976261 (1999-11-01), Moslehi
patent: 6029602 (2000-02-01), Bhatnagar
patent: 6079356 (2000-06-01), Umotoy et al.
patent: 6132512 (2000-10-01), Horie et al.
patent: 6152070 (2000-11-01), Fairbairn et al.
patent: 6190732 (2001-02-01), Omstead et al.
patent: 6245192 (2001-06-01), Dhindsa et al.
patent: 6274495 (2001-08-01), Omstead et al.
patent: 6291341 (2001-09-01), Sharan et al.
patent: 6302964 (2001-10-01), Umotoy et al.
patent: 6364949 (2002-04-01), Or et al.
patent: 6364954 (2002-04-01), Umotoy et al.
patent: 6387182 (2002-05-01), Horie et al.
patent: 6444039 (2002-09-01), Nguyen
patent: 6454860 (2002-09-01), Metzner et al.
patent: 6478872 (2002-11-01), Chae et al.
patent: 6495233 (2002-12-01), Shmurun et al.
patent: 6499425 (2002-12-01), Sandhu et al.
patent: 6502530 (2003-01-01), Turlot et al.
patent: 6508197 (2003-01-01), Omstead et al.
patent: 6645884 (2003-11-01), Yang et al.
patent: 6692575 (2004-02-01), Omstead et al.
patent: 6902629 (2005-06-01), Zheng et al.
patent: 2001/0054381 (2001-12-01), Umotoy et al.
patent: 2002/0017243 (2002-02-01), Pyo
patent: 2002/0092471 (2002-07-01), Kang et al.
patent: 2003/0017268 (2003-01-01), Hu et al.
patent: 2003/0192568 (2003-10-01), Zheng et al.
patent: 2003/0198754 (2003-10-01), Xi et al.
patent: 2004/0052969 (2004-03-01), Lee et al.
patent: 2004/0144490 (2004-07-01), Zhao et al.
patent: 2004/0216844 (2004-11-01), Janakiraman
patent: 2005/0263072 (2005-12-01), Balasubramanian et al.
patent: 0 821 084 (1998-01-01), None
patent: 0 843 339 (1998-05-01), None
patent: 61005515 (1986-01-01), None
patent: 05152208 (1993-06-01), None
patent: 527435 (2003-04-01), None
patent: 539761 (2003-07-01), None
patent: 583335 (2004-04-01), None
patent: WO 99/66101 (1999-12-01), None
patent: WO 01/04376 (2001-01-01), None
patent: WO 01/16396 (2001-03-01), None
patent: WO 03/065424 (2003-08-01), None
Tiemessen, M. et al., “Fluorine induced formation of intermetal dielectric effects”,Advanced Semiconductor Manufacturing Conference and Workshop, 1996, ASMC 96 Proceedings, IEEE/SEMI 1996 Cambridge, MA, USA Nov. 12-14, 1996, New York, NY, USA, IEEE, US, Nov. 12, 1996 pp. 303-307, XP010204545, IBSN: 0-7803-3371-3, “Equipment Commonality”, p. 305.
PCT International Search Report for PCT/US03/39942, dated Jul. 12, 2004 (AMAT/7816.PC).
PCT International Search Report for PCT/US2005/017561, dated Aug. 9, 2005.
Taiwan IPO Notice of Allowance and Search Report dated Apr. 25, 2008, Taiwan Patent Application No. 94116785.
PCT International Search Report and Written Opinion dated Dec. 24, 2008 for International Application No. PCT/US2008/79272. (APPM/011894-PCT P).
Office Action dated Jul. 23, 2008 for U.S. Appl. No. 11/130,554. (APPM/009312).
Office Action dated Oct. 22, 2008 for U.S. Appl. No. 11/130,554. (APPM/009312).

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