Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-10-09
2007-10-09
Nguyen, Tuan H. (Department: 2813)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S283000
Reexamination Certificate
active
11173866
ABSTRACT:
A contact architecture for nanoscale channel devices having contact structures coupling to and extending between source or drain regions of a device having a plurality of parallel semiconductor bodies. The contact structures being able to contact parallel semiconductor bodies having sub-lithographic pitch.
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Brask Justin K.
Chau Robert S.
Datta Suman
Doczy Mark L.
Doyle Brian S.
Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Nguyen Tuan H.
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