Bit line of a semiconductor device and method for...

Details Bit line of a semiconductor device and method for... Bit line of a semiconductor device and method for...

2008-06-18

2010-12-07

Richards, N Drew (Department: 2895)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S238000, C438S240000, C438S254000, C438S255000, C438S303000, C257SE21269, C257SE21275

Reexamination Certificate

active

07846795

ABSTRACT:
A bit line of a semiconductor device includes a first interlayer dielectric film disposed on a semiconductor substrate, a plurality of bit line stacks disposed on the first interlayer dielectric film, a plurality of bit line spacers disposed on side walls of the bit line stacks, and a buffer film disposed on the bit line spacers, the first interlayer dielectric film and the bit line stacks; and a method for fabricating the same.

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