X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1984-05-01
1986-10-14
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378205, 378208, G21K 500, A61B 608
Patent
active
046176810
ABSTRACT:
The present invention is directed, in an X-ray lithographic system characterized by a plurality of work stations, a cartridge, apparatus for mounting a wafer and a mask on the cartridge, a system for moving the cartridge between stations, apparatus in each of the stations for moving the cartridge to a kinematic mount, said kinematic mounts in all of said stations being substantially identical, to the improvement comprising: a bistable foot operable in a first linear elevational mode and in a second angular compliance mode.
REFERENCES:
patent: 4525852 (1985-06-01), Rosenberg
Kreuzer Justin
LaFiandra Carlo
Church Craig E.
Grimes Edwin T.
Murphy Thomas P.
The Perkin-Elmer Corporation
Wieland Charles
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