Bilayer metallization cap for photolithography

Details Bilayer metallization cap for photolithography Bilayer metallization cap for photolithography

1991-02-25

1993-06-15

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437192, 437229, 430272, 430318, H01L 21443, H01L 21465

Patent

active

052197883

ABSTRACT:
A process of patterning a conductive layer on a substrate avoiding webbing yet permitting high density patterning places two layers between the resist and the metal. The first layer is an antireflective coating such as titanium nitride applied to the metal. The second layer is a barrier comprising silicon such as sputtered silicon or SiO.sub.2. The barrier layer may also be a thin coating of spin-on glass. The barrier layer prevents interaction between the TiN and acid groups which are generated during exposure of the resist. With this structure in place the resist is applied, exposed and developed.

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