Bilayer lithographic process

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430313, 430317, 430326, 430328, 156628, 156643, G03C 500, G03C 540

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active

049313517

ABSTRACT:
A method for producing high resolution patterned resist images having excellent etch resistance and superior thermal and dimensional stability comprises the steps of:

REFERENCES:
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patent: 4613398 (1986-09-01), Chiong et al.
patent: 4737425 (1988-04-01), Lin et al.
patent: 4782008 (1988-11-01), Babich et al.
Follett et al, "Polarity Reversal of PMMA by Treatment with Chlorosilanes", Electrochemical Sec., vol. 82-2, Extended Abstracts, Oct. 1982.

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