Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1989-07-13
1990-06-05
Dees, Jose
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430313, 430317, 430326, 430328, 156628, 156643, G03C 500, G03C 540
Patent
active
049313517
ABSTRACT:
A method for producing high resolution patterned resist images having excellent etch resistance and superior thermal and dimensional stability comprises the steps of:
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patent: 4782008 (1988-11-01), Babich et al.
Follett et al, "Polarity Reversal of PMMA by Treatment with Chlorosilanes", Electrochemical Sec., vol. 82-2, Extended Abstracts, Oct. 1982.
Brust Thomas B.
Daly Robert C.
Jech, Jr. Joseph
Lindholm Robert D.
McColgin William C.
Davis William J.
Dees Jose
Eastman Kodak Company
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