Biased pulse DC reactive sputtering of oxide films

Details Biased pulse DC reactive sputtering of oxide films Biased pulse DC reactive sputtering of oxide films

2005-09-16

2008-08-19

Estrada, Michelle (Department: 2823)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S771000, C257SE21273, C257SE21278, C257SE21462

Reexamination Certificate

active

07413998

ABSTRACT:
A biased pulse DC reactor for sputtering of oxide films is presented. The biased pulse DC reactor couples pulsed DC at a particular frequency to the target through a filter which filters out the effects of a bias power applied to the substrate, protecting the pulsed DC power supply. Films deposited utilizing the reactor have controllable material properties such as the index of refraction. Optical components such as waveguide amplifiers and multiplexers can be fabricated using processes performed on a reactor according to the present invention.

REFERENCES:
patent: 3309302 (1967-03-01), Heil
patent: 3616403 (1971-10-01), Collins et al.
patent: 3850604 (1974-11-01), Klein
patent: 4006070 (1977-02-01), King et al.
patent: 4111523 (1978-09-01), Kaminow et al.
patent: 4437966 (1984-03-01), Hope et al.
patent: 4587225 (1986-05-01), Tsukuma et al.
patent: 4619680 (1986-10-01), Nourshargh et al.
patent: RE32449 (1987-06-01), Claussen
patent: 4710940 (1987-12-01), Sipes, Jr.
patent: 4785459 (1988-11-01), Baer
patent: 4915810 (1990-04-01), Kestigian et al.
patent: 4978437 (1990-12-01), Wirz
patent: 5085904 (1992-02-01), Deak et al.
patent: 5107538 (1992-04-01), Benton et al.
patent: 5119460 (1992-06-01), Bruce et al.
patent: 5173271 (1992-12-01), Chen et al.
patent: 5174876 (1992-12-01), Buchal et al.
patent: 5196041 (1993-03-01), Tumminelli et al.
patent: 5200029 (1993-04-01), Bruce et al.
patent: 5206925 (1993-04-01), Nakazawa et al.
patent: 5225288 (1993-07-01), Beeson et al.
patent: 5237439 (1993-08-01), Misono et al.
patent: 5252194 (1993-10-01), Demaray et al.
patent: 5287427 (1994-02-01), Atkins et al.
patent: 5296089 (1994-03-01), Chen et al.
patent: 5303319 (1994-04-01), Ford et al.
patent: 5306569 (1994-04-01), Hiraki
patent: 5309302 (1994-05-01), Vollmann
patent: 5338625 (1994-08-01), Bates et al.
patent: 5355089 (1994-10-01), Treger
patent: 5381262 (1995-01-01), Arima et al.
patent: 5427669 (1995-06-01), Drummond
patent: 5457569 (1995-10-01), Liou et al.
patent: 5475528 (1995-12-01), LaBorde
patent: 5478456 (1995-12-01), Humpal et al.
patent: 5483613 (1996-01-01), Bruce et al.
patent: 5499207 (1996-03-01), Miki et al.
patent: 5512147 (1996-04-01), Bates et al.
patent: 5538796 (1996-07-01), Schaffer et al.
patent: 5555127 (1996-09-01), Abdelkader et al.
patent: 5563979 (1996-10-01), Bruce et al.
patent: 5565071 (1996-10-01), Demaray et al.
patent: 5569520 (1996-10-01), Bates
patent: 5591520 (1997-01-01), Migliorini et al.
patent: 5597660 (1997-01-01), Bates
patent: 5603816 (1997-02-01), Demaray et al.
patent: 5607560 (1997-03-01), Hirabayashi et al.
patent: 5607789 (1997-03-01), Treger et al.
patent: 5612152 (1997-03-01), Bates
patent: 5613995 (1997-03-01), Bhandarkar et al.
patent: 5654054 (1997-08-01), Tropsha et al.
patent: 5654984 (1997-08-01), Hershbarger et al.
patent: 5681671 (1997-10-01), Orita et al.
patent: 5686360 (1997-11-01), Harvey, III et al.
patent: 5689522 (1997-11-01), Beach
patent: 5693956 (1997-12-01), Shi et al.
patent: 5718813 (1998-02-01), Drummond
patent: 5719976 (1998-02-01), Henry et al.
patent: 5731661 (1998-03-01), So et al.
patent: 5738731 (1998-04-01), Shindo et al.
patent: 5755938 (1998-05-01), Fukui et al.
patent: 5757126 (1998-05-01), Harvey, III et al.
patent: 5762768 (1998-06-01), Goy et al.
patent: 5771562 (1998-06-01), Harvey, III et al.
patent: 5792550 (1998-08-01), Phillips et al.
patent: 5811177 (1998-09-01), Shi et al.
patent: 5830330 (1998-11-01), Lantsman
patent: 5831262 (1998-11-01), Greywall et al.
patent: 5841931 (1998-11-01), Foresi et al.
patent: 5847865 (1998-12-01), Gopinath et al.
patent: 5849163 (1998-12-01), Ichikawa et al.
patent: 5853830 (1998-12-01), McCaulley et al.
patent: 5855744 (1999-01-01), Halsey et al.
patent: 5870273 (1999-02-01), Sogabe et al.
patent: 5882946 (1999-03-01), Otani
patent: 5900057 (1999-05-01), Buchal et al.
patent: 5930584 (1999-07-01), Sun et al.
patent: 5942089 (1999-08-01), Sproul et al.
patent: 5948215 (1999-09-01), Lantsman
patent: 5952778 (1999-09-01), Haskal et al.
patent: 5961682 (1999-10-01), Lee et al.
patent: 5966491 (1999-10-01), DiGiovanni
patent: 5977582 (1999-11-01), Fleming et al.
patent: 6001224 (1999-12-01), Drummond et al.
patent: 6004660 (1999-12-01), Topolski et al.
patent: 6024844 (2000-02-01), Drummond et al.
patent: 6046081 (2000-04-01), Kuo
patent: 6051114 (2000-04-01), Yao et al.
patent: 6051296 (2000-04-01), McCaulley et al.
patent: 6052397 (2000-04-01), Jeon et al.
patent: 6057557 (2000-05-01), Ichikawa
patent: 6058233 (2000-05-01), Dragone
patent: 6071323 (2000-06-01), Kawaguchi
patent: 6077642 (2000-06-01), Ogata et al.
patent: 6080643 (2000-06-01), Noguchi et al.
patent: 6088492 (2000-07-01), Kaneko et al.
patent: 6093944 (2000-07-01), VanDover
patent: 6106933 (2000-08-01), Nagai et al.
patent: 6117279 (2000-09-01), Smolanoff et al.
patent: 6146225 (2000-11-01), Sheats et al.
patent: 6154582 (2000-11-01), Bazylenko et al.
patent: 6157765 (2000-12-01), Bruce et al.
patent: 6162709 (2000-12-01), Raoux et al.
patent: 6165566 (2000-12-01), Tropsha
patent: 6176986 (2001-01-01), Watanabe et al.
patent: 6197167 (2001-03-01), Tanaka
patent: 6198217 (2001-03-01), Suzuki et al.
patent: 6204111 (2001-03-01), Uemoto et al.
patent: 6210544 (2001-04-01), Sasaki
patent: 6214660 (2001-04-01), Uemoto et al.
patent: 6232242 (2001-05-01), Hata et al.
patent: 6236793 (2001-05-01), Lawrence et al.
patent: 6242129 (2001-06-01), Johnson
patent: 6248291 (2001-06-01), Nakagama et al.
patent: 6248640 (2001-06-01), Nam
patent: 6261917 (2001-07-01), Quek et al.
patent: 6280585 (2001-08-01), Obinata et al.
patent: 6281142 (2001-08-01), Basceri et al.
patent: 6287986 (2001-09-01), Mihara
patent: 6288835 (2001-09-01), Nilsson et al.
patent: 6290821 (2001-09-01), McLeod
patent: 6290822 (2001-09-01), Fleming et al.
patent: 6300215 (2001-10-01), Shin
patent: 6302939 (2001-10-01), Rabin et al.
patent: 6306265 (2001-10-01), Fu et al.
patent: 6344419 (2002-02-01), Forster et al.
patent: 6350353 (2002-02-01), Gopalraja et al.
patent: 6356694 (2002-03-01), Weber
patent: 6358810 (2002-03-01), Dornfest et al.
patent: 6361662 (2002-03-01), Chiba et al.
patent: 6365319 (2002-04-01), Heath et al.
patent: 6391166 (2002-05-01), Wang
patent: 6409965 (2002-06-01), Nagata et al.
patent: 6413382 (2002-07-01), Wang et al.
patent: 6413645 (2002-07-01), Graff et al.
patent: 6416598 (2002-07-01), Sircar
patent: 6423776 (2002-07-01), Akkapeddi et al.
patent: 6433380 (2002-08-01), Shin
patent: 6444750 (2002-09-01), Touhsaent
patent: 6452717 (2002-09-01), Endo
patent: 6488822 (2002-12-01), Moslehi
patent: 6506289 (2003-01-01), Demaray et al.
patent: 6511615 (2003-01-01), Dawes et al.
patent: 6533907 (2003-03-01), Demaray et al.
patent: 6537428 (2003-03-01), Xiong et al.
patent: 6563998 (2003-05-01), Farah et al.
patent: 6576546 (2003-06-01), Gilbert et al.
patent: 6602338 (2003-08-01), Chen et al.
patent: 6605228 (2003-08-01), Kawaguchi et al.
patent: 6615614 (2003-09-01), Makikawa et al.
patent: 6632563 (2003-10-01), Krasnov et al.
patent: 6673716 (2004-01-01), D'Couto et al.
patent: 6750156 (2004-06-01), Le et al.
patent: 6760520 (2004-07-01), Medin et al.
patent: 6768855 (2004-07-01), Bakke et al.
patent: 6827826 (2004-12-01), Demaray et al.
patent: 6846765 (2005-01-01), Imamura et al.
patent: 6849165 (2005-02-01), Koppel et al.
patent: 6884327 (2005-04-01), Pan et al.
patent: 7262131 (2007-08-01), Narasimhan et al.
patent: 2001/0027159 (2001-10-01), Kaneyoshi
patent: 2001/0031122 (2001-10-01), Lackritz et al.
patent: 2001/0034106 (2001-10-01), Moise et al.
patent: 2001/0041460 (2001-11-01), Wiggins
patent: 2002/0033330 (2002-03-01), Demaray et al.
patent: 2002/0076133 (2002-06-01), Li et al.
patent: 2002/0106297 (2002-08-01), Ueno et al.
patent: 2002/0134671 (2002-09-01), Demaray et al.
patent: 2002/0170821 (2002-11-01), Sandlin et al.
patent: 2002/0191916 (2002-12-01), Frish et al.
patent: 2003/0019326 (2003-01-01), Han et al.
patent: 2003/0022487 (2003-01-01), Yoon et al.
patent: 2003/0042131 (2003-03-01), Johnson
patent: 2003/0044118 (2003-03-01), Zhou et al.
patent: 2003/0063883 (2003-04-01), Demaray et al.
paten

Affiliated with

Also associated with

Rating

Biased pulse DC reactive sputtering of oxide films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Biased pulse DC reactive sputtering of oxide films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Biased pulse DC reactive sputtering of oxide films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4013601