Bias-tracking D.C. power circuit for an electrostatic chuck

Details Bias-tracking D.C. power circuit for an electrostatic chuck Bias-tracking D.C. power circuit for an electrostatic chuck

1996-06-19

1998-04-07

Fleming, Fritz

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

H02N 1300

Patent

active

057371750

ABSTRACT:
A DC power circuit for a electrostatic chuck adapted for use in a plasma etching system is disclosed. The power circuit receives an input that reflects a voltage bias on the workpiece caused by the application of an RF signal for creating the plasma. A DC power supply outputs a differential voltage that is balanced by inputting the voltage bias to a common reference node. The balanced DC output voltages are then presented to two electrodes of the ESC to create a clamping force securing the workpiece to the chuck at a lower voltage than would otherwise be applied in the absence of the bias feedback.

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