Bi-modal halo implantation

Details Bi-modal halo implantation Bi-modal halo implantation

2007-02-13

2007-02-13

Hoang, Quoc (Department: 2818)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S306000, C257S206000, C257SE21618, C257SE21633

Reexamination Certificate

active

10790939

ABSTRACT:
Methods of fabricating halo regions are provided. In one aspect, a method is provided of fabricating a first halo region and a second halo region for a circuit device of a first conductivity type and having a gate structure with first and second sidewalls. The first halo region of a second conductivity type is formed by implanting the substrate with impurities in a first direction toward the first sidewall of the gate structure. The second halo region of the second conductivity type is formed by implanting the substrate with impurities in a second direction toward the second sidewall of the gate structure. The first and second halo regions are formed without implanting impurities in a direction substantially perpendicular to the first and second directions.

REFERENCES:
patent: 5227321 (1993-07-01), Lee et al.
patent: 5580804 (1996-12-01), Joh
patent: 6030871 (2000-02-01), Eitan
patent: 6114211 (2000-09-01), Fulford et al.
patent: 6489223 (2002-12-01), Hook et al.
patent: 6566204 (2003-05-01), Wang et al.
patent: 6620679 (2003-09-01), Tzeng et al.
patent: 6747325 (2004-06-01), Shih
patent: 6784062 (2004-08-01), Cho et al.
patent: 6828202 (2004-12-01), Horch
patent: 2003/0032231 (2003-02-01), Efland et al.
U.S. Appl. No. 10/693,016, filed Nov. 24, 2003, Scott Goad et al.
Stanley Wolf and Richard N. Tauber;Silicon Processing for the VLSI Era, vol. 3—The Submicron MOSFET; pp. 226-232, 240, 309-311 and 621-622; 1995.
Terence B. Hook et al.;High-Performance Logic and High-Gain Analog CMOS Transistors Formed by a Shadow-Mask Technique With a Single Implant Step; IEEE Transactions on Electron Devices, vol. 49, No. 9, Sep. 2002; pp. 1623-1627.
U.S. Appl. No. 10/883,925, filed Jul. 2, 2004, Edward E. Ehrichs.

Affiliated with

Also associated with

Rating

Bi-modal halo implantation does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Bi-modal halo implantation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Bi-modal halo implantation will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3883648