Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-12-19
2006-12-19
Huynh, Andy (Department: 2818)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S211000, C438S257000, C257SE21680, C257SE21422, C257SE29129
Reexamination Certificate
active
07151021
ABSTRACT:
A bi-directional read/program non-volatile memory cell and array is capable of achieving high density. Each memory cell has two spaced floating gates for storage of charges thereon. The cell has spaced apart source/drain regions with a channel therebetween, with the channel having three portions. One of the floating gate is over a first portion; another floating gate is over a second portion, and a gate electrode controls the conduction of the channel in the third portion between the first and second portions. A control gate is connected to each of the source/drain regions, and is also capacitively coupled to the floating gate. The cell programs by hot channel electron injection, and erases by Fowler-Nordheim tunneling of electrons from the floating gate to the gate electrode. Bi-directional read permits the cell to be programmed to store bits, with one bit in each floating gate.
REFERENCES:
patent: 6151248 (2000-11-01), Harari et al.
patent: 6329685 (2001-12-01), Lee
patent: 6593177 (2003-07-01), Lee
Chen Bomy
Frayer Jack
Lee Dana
DLA Piper (US) LLP
Huynh Andy
Silicon Storage Technology, Inc.
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