Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2008-05-21
2011-11-08
Arora, Ajay K (Department: 2892)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S108000, C438S612000, C257SE21001, C257S778000
Reexamination Certificate
active
08053349
ABSTRACT:
A semiconductor flip-chip ball grid array package (600) with one-metal-layered substrate. The sites (611) of a two-dimensional array become usable for attaching solder balls of the signal (non-common net assignment) I/O type to the substrate under the chip area (601), when the sites can be routed for metal plating (620). The space to place a maximum number (614) of signal routing traces is opened up by interrupting the periodicity of the site array from the edge (602) of the substrate towards the center under the chip. The periodicity is preferably interrupted by depopulating entire aligned lines and rows of the two-dimensional array.
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Dally, James W. Packaging of Electronic Systems. 1990. McGraw Hill, pp. 129-131.
Harper Peter R.
Lyne Kevin
Rhyner Kenneth R.
Wontor David G.
Arora Ajay K
Brady III Wade J.
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
Tung Yingsheng
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