Batch processing platform for ALD and CVD

Details Batch processing platform for ALD and CVD Batch processing platform for ALD and CVD

2006-06-26

2010-11-16

Cleveland, Michael (Department: 1712)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C156S345310, C156S345320, C414S217000, C414S940000

Reexamination Certificate

active

07833351

ABSTRACT:
A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.

REFERENCES:
patent: 4770590 (1988-09-01), Hugues et al.
patent: 5464453 (1995-11-01), Tong et al.
patent: 5562383 (1996-10-01), Iwai et al.
patent: 5658355 (1997-08-01), Cottevieille et al.
patent: 5955215 (1999-09-01), Kurzweil et al.
patent: 6066210 (2000-05-01), Yonemitsu et al.
patent: 6174337 (2001-01-01), Keenan
patent: 6275371 (2001-08-01), Yoshio et al.
patent: 6426863 (2002-07-01), Munshi
patent: 6493211 (2002-12-01), Sugiyama et al.
patent: 6496357 (2002-12-01), Lee et al.
patent: 6514296 (2003-02-01), Tsai et al.
patent: 6517691 (2003-02-01), Bluck et al.
patent: 6616875 (2003-09-01), Lee et al.
patent: 6632068 (2003-10-01), Zinger et al.
patent: 6697249 (2004-02-01), Maletin et al.
patent: 7061749 (2006-06-01), Liu et al.
patent: 2001/0036393 (2001-11-01), Kroeker
patent: 2003/0178142 (2003-09-01), de Ridder et al.
patent: 2004/0194706 (2004-10-01), Wang et al.
patent: 2005/0175435 (2005-08-01), Soraoka et al.
patent: 2005/0255717 (2005-11-01), Takahashi
patent: 2006/0134330 (2006-06-01), Ishikawa et al.
Burke “Ultracapacitors: Why, How, and Where is the Technology”, Institute of Transportation Studies (University of California Davis) Journal of Power Sources 91 (2000) pp. 37-50.
Conway, “The Electrochemical Behavior of Ruthenium Oxide (RuO2) as Material for Electrochemical Capacitors” Electrochemical Supercapacitors Scientific Fundamentals and Technological Applications Chapter 11 pp. 259-297 published 1999 Kluwer Academic.
Conway, Electrochemical Supercapacitors Scientific Fundamentals and Technological Applications Chapters 1 through 7 pp. 1-168 published 1999 Kluwer Academic.
PCT International Search Report and Written Opinion dated Jan. 10, 2008 for International Application No. PCT/US2007/71368.

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