Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2007-07-10
2007-07-10
Le, Hoa Van (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
Reexamination Certificate
active
11143126
ABSTRACT:
A basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The supercritical fluid or liquid solvent may be carbon dioxide and the base may be quaternary ammonium salt that has side groups that increase the solubility of the quaternary ammonium salt in carbon dioxide.
REFERENCES:
patent: 4944837 (1990-07-01), Nishikawa et al.
patent: 6924086 (2005-08-01), Arena-Foster et al.
patent: 2004/0072097 (2004-04-01), Kodama
Jackson, Kevin, et al., Microemulsions in Supercritical Hydrochlorofluorocarbons, Langmuir 1996, 12, pp. 5289-5295, © 1996 American Chemical Society.
Namatsu, Hideo, et al., Supercritical resist dryer, J. Vac. Sci. Technol. B 18(2), Mar./Apr. 2000, pp. 780-784, © 2000 American Vacuum Society.
Selva, Maurizio, et al., The synthesis of alkyl carbamates from primary aliphatic amines and dialkyl carbonates in supercritical carbon dioxide, Tetrahedron Letters 43 (2002), pp. 1217-1219, © 2002 Elsevier Science Ltd.
Webb, Kimberly F., et al., Solubility and diffusion of carbon dioxide in polymers, Fluid Phase Equilibria 158-160 (1999) pp. 1029-1034, © 1999 Elsevier Science B.V.
Ziegler, Kirk J., et al., Producing ‘pH switches’ in biphasic water-CO2systems, J. of Supercritical Fluids 27 (2003) pp. 109-117, © 2002 Elsevier Science B.V.
Clark Shan C.
Clarke James S.
Ho Kim-Khanh
Meagley Robert P.
Putna Ernisse S.
Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Le Hoa Van
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